When is Corning HPFS® 7980 Fused Silica my best choice of material? A Comprehensive Overview:
Corning HPFS® 7980 Fused Silica is a high-purity synthetic silica glass, renowned for its ultra-low thermal expansion coefficient, exceptional UV and IR internal transmittance, and remarkably low refractive index variations leading to state-of-the-art homogeneity values. With its large size capabilities and low birefringence, this material is specifically engineered to meet the demanding requirements of various high-tech industries, including optics, semiconductors, and aerospace. Its unique characteristics make it a preferred choice for applications where precision, durability, and optical clarity are paramount.
One of the key advantages of Corning HPFS® 7980 Fused Silica is its exceptional UV Internal Transmittance (Ti):
- Standard Grade Ti ≥ 88.00% @ 185nm (Equivalent to Te ≥ 80.00 % @ 185nm)
- KrF Grade Ti ≥ 99.90% @ 248 nm
- ArF Grade meets high Ti ≥ 99.50% @ 193nm
Additionally, with its ultra-low coefficient of thermal expansion (0.52 x 10-6/K over the 5°C to 35°C temperature range, 0.57 x 10-6/K over the 0°C to 200°C temperature range, and 0.48 x 10-6/K over the -100°C to +200°C temperature range) Corning HPFS® 7980 Fused Silica can maintain dimensional stability under extreme temperature fluctuations.
Other notable properties that make Corning HPFS® 7980 Fused Silica an ideal choice for advanced optical and photonic applications are its OH Content of 800 – 1000ppm, Softening Point of 1585˚C, and Strain Point of 893˚C.
Characteristics of Corning HPFS® 7980 Fused Silica:
- Ultra-High Purity: Boasts exceptional purity, with minimal trace impurities, making it ideal for applications requiring precise optical transmission and high chemical resistance.
- Optical Transparency: Exhibits outstanding transparency across a wide spectral range, particularly in the ultraviolet (UV) and infrared (IR) regions, making it suitable for advanced optical applications.
- Thermal Stability: Features an ultra-low coefficient of thermal expansion and high resistance to thermal shock, ensuring dimensional stability even under extreme temperature conditions.
- Chemical Inertness: Highly resistant to most acids, bases, and other corrosive chemicals, allowing it to withstand harsh chemical environments without degradation.
- Mechanical Strength: Despite its brittleness, Corning HPFS® 7980 Fused Silica maintains sufficient mechanical strength to withstand operational stresses in a variety of applications.
- Low Dielectric Loss: Offers excellent electrical insulation properties, with low dielectric loss, making it suitable for high-frequency applications in electronics.
- Radiation Resistance: Demonstrates high resistance to radiation damage, maintaining its optical and mechanical properties even after prolonged exposure to high-energy radiation.
Top Five Industries and Applications of Corning HPFS® 7980 Fused Silica:
- Optics and Photonics: Corning HPFS® 7980 Fused Silica is extensively used in the optics and photonics industries due to its exceptional optical clarity and thermal stability. Key applications include:
- Precision lenses and mirrors for high-power lasers, where thermal stability and UV transmission are critical.
- Beam splitters, windows, and prisms for optical instruments requiring minimal absorption and high transmission.
- UV and IR optical components for scientific instruments, including spectrometers and telescopes.
- Semiconductor Manufacturing: In the semiconductor industry, where purity and precision are paramount, Corning HPFS® 7980 Fused Silica plays a vital role. Key applications include:
- Photomask substrates for lithography processes, ensuring high precision and dimensional stability.
- Furnace liners used in high-temperature processes such as oxidation and annealing.
- Etching and deposition process components, where chemical resistance and thermal stability are crucial.
- Aerospace and Defense: Corning HPFS® 7980 Fused Silica is critical in aerospace and defense applications, where materials must perform reliably under extreme conditions. Key applications include:
- Optical windows and domes for missile guidance systems and satellite sensors, requiring durability and optical clarity in harsh environments.
- Protective covers for sensors and cameras in spacecraft, ensuring consistent performance under intense radiation and temperature extremes.
- IR-transparent windows and lenses for thermal imaging systems used in military and surveillance applications.
- High-Temperature Processes: Industries involved in high-temperature processes benefit from Corning HPFS® 7980 Fused Silica’s ability to maintain its properties at elevated temperatures. Key applications include:
- Crucibles and containers for high-purity metal and glass melting, where thermal shock resistance and purity are essential.
- Thermocouple sheaths and other protective components used in industrial furnaces and kilns.
- Heat-resistant optics for high-temperature measurement and monitoring equipment.
- Medical Technology: Corning HPFS® 7980 Fused Silica finds significant use in medical technology due to its biocompatibility and optical properties. Key applications include:
- Medical imaging optics, such as endoscope lenses and laser delivery systems, requiring high transparency and durability.
- UV-transparent windows and filters for sterilization equipment, ensuring effective pathogen control.
- Substrates for biosensors and diagnostic devices, where precision and chemical inertness are critical.
Corning HPFS® 7980 Fused Silica is a material that embodies the pinnacle of innovation in optical and thermal performance. Its versatility, combined with its unmatched purity and stability, makes it an indispensable material across a wide range of industries, from cutting-edge semiconductor manufacturing to advanced aerospace technologies.
